-
1
-
-
57049089401
-
-
International Technology Roadmap for Semiconductors, ITRS, Online, Available
-
International Technology Roadmap for Semiconductors, ITRS 2007. [Online]. Available: http://www.itrs.net
-
(2007)
-
-
-
2
-
-
46049088349
-
3-TaN) cell technology
-
3-TaN) cell technology," in IEDM Tech. Dig., 2006, pp. 54-55.
-
(2006)
IEDM Tech. Dig
, pp. 54-55
-
-
Park, Y.1
Choi, J.2
Kang, C.3
Lee, C.4
Shin, Y.5
Choi, B.6
Kim, J.7
Jeon, S.8
Sel, J.9
Park, J.10
Choi, K.11
Yoo, T.12
Sim, J.13
Kim, K.14
-
3
-
-
0036714604
-
Metal nanocrystal memories - Part I: Device design and fabrication
-
Sep
-
Z. Liu, C. Lee, V. Narayanan, G. Pei, and E. C. Kan, "Metal nanocrystal memories - Part I: Device design and fabrication," IEEE Trans. Electron Devices, vol. 49, no. 9, pp. 1606-1613, Sep. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.9
, pp. 1606-1613
-
-
Liu, Z.1
Lee, C.2
Narayanan, V.3
Pei, G.4
Kan, E.C.5
-
4
-
-
33847725490
-
Enhancement of memory window in short channel non-volatile memory devices using double layer tungsten nanocrystals
-
S. K. Samanta, P. K. Singh, W. J. Yoo, G. Samudra, Y.-C. Yeo, L. K. Bera, and N. Balasubramanian, "Enhancement of memory window in short channel non-volatile memory devices using double layer tungsten nanocrystals," in IEDM Tech. Dig., 2005, pp. 170-173.
-
(2005)
IEDM Tech. Dig
, pp. 170-173
-
-
Samanta, S.K.1
Singh, P.K.2
Yoo, W.J.3
Samudra, G.4
Yeo, Y.-C.5
Bera, L.K.6
Balasubramanian, N.7
-
5
-
-
39749179836
-
Extensive reliability analysis of tungsten dot NC devices embedded in HfAlO lugh-k dielectric under NAND (FN/FN) operation
-
P. K. Singh and A. Nainani, "Extensive reliability analysis of tungsten dot NC devices embedded in HfAlO lugh-k dielectric under NAND (FN/FN) operation," in Proc. IPFA, 2007, pp. 197-201.
-
(2007)
Proc. IPFA
, pp. 197-201
-
-
Singh, P.K.1
Nainani, A.2
-
6
-
-
50249146274
-
Development of a 3D simulator for metal nanocrystal (NC) Flash memories under NAND operation
-
A. Nainani, S. Palit, P. K. Singh, U. Ganguly, N. Krishna, J. Vasi, and S. Mahapatra, "Development of a 3D simulator for metal nanocrystal (NC) Flash memories under NAND operation," in IEDM Tech. Dig., 2007, pp. 947-950.
-
(2007)
IEDM Tech. Dig
, pp. 947-950
-
-
Nainani, A.1
Palit, S.2
Singh, P.K.3
Ganguly, U.4
Krishna, N.5
Vasi, J.6
Mahapatra, S.7
-
7
-
-
0041409576
-
Impact of crystal size and tunnel dielectric on semiconductor nanocrystal memory performance
-
Sep
-
M. She and T.-J. King, "Impact of crystal size and tunnel dielectric on semiconductor nanocrystal memory performance," IEEE Trans. Electron Devices, vol. 50, no. 9, pp. 1934-1940, Sep. 2003.
-
(2003)
IEEE Trans. Electron Devices
, vol.50
, Issue.9
, pp. 1934-1940
-
-
She, M.1
King, T.-J.2
-
8
-
-
8144221080
-
Nonvolatile Flash memory device using Ge nanocrystals embedded in HfAlO high-k tunneling and control oxides: Device fabrication and electrical performance
-
Nov
-
J. H. Chen, Y. Q. Wang, W. J. Yoo, Y.-C. Yeo, G. Samudra, D. S. H. Chan, A. Y. Du, and D.-L. Kwong, "Nonvolatile Flash memory device using Ge nanocrystals embedded in HfAlO high-k tunneling and control oxides: Device fabrication and electrical performance," IEEE Trans. Electron Devices, vol. 51, no. 11, pp. 1840-1848, Nov. 2004.
-
(2004)
IEEE Trans. Electron Devices
, vol.51
, Issue.11
, pp. 1840-1848
-
-
Chen, J.H.1
Wang, Y.Q.2
Yoo, W.J.3
Yeo, Y.-C.4
Samudra, G.5
Chan, D.S.H.6
Du, A.Y.7
Kwong, D.-L.8
-
9
-
-
0842266586
-
Operational and reliability comparison of discrete-storage nonvolatile memories: Advantages of single- and double-layer metal nanocrystals
-
C. Lee, A. Gorur-Seetharam, and E. C. Kan, "Operational and reliability comparison of discrete-storage nonvolatile memories: Advantages of single- and double-layer metal nanocrystals," in IEDM Tech. Dig., 2003, pp. 557-560.
-
(2003)
IEDM Tech. Dig
, pp. 557-560
-
-
Lee, C.1
Gorur-Seetharam, A.2
Kan, E.C.3
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