Alternating magnetic field-assisted crystallization of Si films without metal catalyst

Journal of Crystal Growth

Volumn 310, Issue 24, 2008, Pages 5317-5320

  Seo, Hyun Sik ^a,b   Kim, Chang Dong ^a   Kang, InByeong ^a   Chung, In Jae ^a   Jeong, Min Chang ^b   Myoung, Jae Min ^b   Shin, Dong Hoon ^c  

^a LG Display Co Ltd   (South Korea)

^b Yonsei University   (South Korea)

^c Viatron Technologies Corp   (South Korea)

Author keywords

A3. Alternating magnetic field assisted crystallization; B2. a Si:H; B2. Poly Si; B3. AM OLED; B3. TFT LCD

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CATALYSIS; CATALYSTS; CRYSTAL GROWTH; CRYSTALLIZATION; DRAIN CURRENT; FLAT PANEL DISPLAYS; GRAIN BOUNDARIES; MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETISM; NANOCRYSTALLINE ALLOYS; ORGANIC LIGHT EMITTING DIODES (OLED); POLYSILICON; SILICON; THIN FILM TRANSISTORS;

A3. ALTERNATING MAGNETIC FIELD-ASSISTED CRYSTALLIZATION; B2. A-SI:H; B2. POLY-SI; B3. AM-OLED; B3. TFT-LCD;

AMORPHOUS SILICON;

EID: 56949106371     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.09.182     Document Type: Article

References (19)

1. Uchikoga S., and Ibaraki N. Thin Solid Films 383 (2001) 19
2. T. Sameshima, IMID Proceedings, 2004, p. 129.
3. Seo J.M., Jeong M.C., and Myoung J.M. J. Crystal Growth 295 (2006) 119
4. Cheng H.C., Huang C.Y., Wang F.S., Lin K.H., and Tarntair F.G. Jpn. J. Appl. Phys. 39 (2000) L19
5. Sameshima T., Usui S., and Sekiya M. IEEE Electron Device Lett. 7 (1986) 276
6. Oh C.H., and Matsumura M. IEEE Electron Device Lett. 22 (2001) 20
7. Masaki Y., Lecomber P.G., and Fitzgerald A.G. J. Appl. Phys. 74 (1993) 129
8. J.S. You, S.H. Kim, Y.H. Jung, Y.J. Kim, S.W. Lee, H.S. Seo, C.D. Kim, AMLCD Digest, 2003, p. 161.
9. Hayzelden C., Batstone J.L., and Cammarata R.C. Appl. Phys. Lett. 60 (1992) 225
10. Lee S.W., Jeon Y.C., and Joo S.K. Appl. Phys. Lett. 66 (1995) 1671
11. Kim H.Y., Kim B., Bae J.U., Hwang K.J., Seo H.S., and Kim C.D. Appl. Phys. Lett. 81 (2002) 5180
12. Y. Hirakata, M. Sakakura, S. Eguchi, Y. Shionoiri, S. Yamazaki, H. Washio, Y. Kubota, N. Makita, M. Hijikigawa, SID Digest, 2000, p. 1014.
13. Lee S.H., Shin D.H., Kim H.J., Park S., and Lee J.S. Int. J. Therm. Sci. 46 (2007) 404
14. Hatalis M.K., and Greve D.W. J. Appl. Phys. 98 (2005) 114911
15. H.K. Chung, K.Y. Lee, SID Digest, 2005, p. 956.
16. Fejfar A., Stuchlik J., Mates T., Ledinsky M., Honda S., and Kocka J. Appl. Phys. Lett. 87 (2005) 011901
17. Griffiths D.J. Introduction to Electrodynamics. third ed. (1999), Prentice-Hall, Upper Saddle River, NJ p. 301
18. Suzuki T., Venkataramanan V., and Aono M. Jpn. J. Appl. Phys. 40 (2001) 1119
19. H.S. Seo, D.H. Nam, N.B. Choi, S.H. Paek, T.J. Ahn, J.S. Yoo, J.M. Yoon, S.W. Lee, C.D. Kim, I.J. Chung, IDW Proccedings, 2005, p. 1129.