SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 87, Issue 1, 2005, Pages

Patterning of hydrogenated microcrystalline silicon growth by magnetic field

(6) Fejfar, A a Stuchlik J a Mates, T a Ledinsky M a Honda, S a Kocka J a

a INSTITUTE OF PHYSICS (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE GRAIN NUCLEI; MAGNETRON; MICRO-RAMAN SPECTROSCOPY; MICROCRYSTALLINE SILICON;

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; HYDROGEN; MAGNETIC FIELD EFFECTS; MICROSTRUCTURE; PERMANENT MAGNETS; RAMAN SPECTROSCOPY; SILANES; SUBSTRATES;

SILICON;

EID: 24144452506 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1984102 Document Type: Article

Times cited : (8)

References (19)

1
- 1842763373
- A. Shah, M. Vaněček, J. Meier, F. Meillaud, J. Guillet, D. Fischer, C. Droz, X. Niquille, S. Fay, E. Vallat-Sauvain, V. Terrazzoni-Daudrix, and J. Bailat, J. Non-Cryst. Solids 338, 639 (2004).
- (2004) J. Non-Cryst. Solids , vol.338 , pp. 639
- Shah, A.¹ Vaněč² Ek, M.³ Meier, J.⁴ Meillaud, F.⁵ Guillet, J.⁶ Fischer, D.⁷ Droz, C.⁸ Niquille, X.⁹ Fay, S.¹⁰ Vallat-Sauvain, E.¹¹ Terrazzoni-Daudrix, V.¹² Bailat, J.¹³

2
- 22144484594
- J. Kočka, A. Fejfar, T. Mates, P. Fojtík, K. Dohnalová, K. Luterová, J. Stuchlík, H. Stuchlíková, I. Pelant, B. Rezek, A. Stemmer, and M. Ito, Phys. Status Solidi C 1, 1097 (2004).
- (2004) Phys. Status Solidi C , vol.1 , pp. 1097
- Koč¹ Ka, J.² Fejfar, A.³ Mates, T.⁴ Fojtík, P.⁵ Dohnalová, K.⁶ Luterová, K.⁷ Stuchlík, J.⁸ Stuchlíková, H.⁹ Pelant, I.¹⁰ Rezek, B.¹¹ Stemmer, A.¹² Ito, M.¹³

3
- 0000602777
- J. Yang, A. Banerjee, and S. Guha, Appl. Phys. Lett. 70, 2975 (1997).
- (1997) Appl. Phys. Lett. , vol.70 , pp. 2975
- Yang, J.¹ Banerjee, A.² Guha, S.³

4
- 0035247829
- M. Ito, C. Koch, V. Švrček, M. B. Schubert, and J. H. Werner, Thin Solid Films 383, 129 (2001).
- (2001) Thin Solid Films , vol.383 , pp. 129
- Ito, M.¹ Koch, C.² Švrč³ Ek, V.⁴ Schubert, M.B.⁵ Werner, J.H.⁶

5
- 79956057171
- S. Ferlauto, R. J. Koval, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 80, 2666 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2666
- Ferlauto, S.¹ Koval, R.J.² Wronski, C.R.³ Collins, R.W.⁴

6
- 0001682548
- B. Rezek, J. Stuchlík, A. Fejfar, and J. Kočka, Appl. Phys. Lett. 74, 1475 (1999).
- (1999) Appl. Phys. Lett. , vol.74 , pp. 1475
- Rezek, B.¹ Stuchlík, J.² Fejfar, A.³ Koč⁴ Ka, J.⁵

7
- 6444242958
- T. Mates, A. Fejfar, I. Drbohlav, B. Rezek, P. Fojtík, K. Luterová, J. Kočka, C. Koch, M. B. Schubert, M. Ito, K. Ro, and H. Uyama, J. Non-Cryst. Solids 299, 767 (2002).
- (2002) J. Non-Cryst. Solids , vol.299 , pp. 767
- Mates, T.¹ Fejfar, A.² Drbohlav, I.³ Rezek, B.⁴ Fojtík, P.⁵ Luterová, K.⁶ Koč⁷ Ka, J.⁸ Koch, C.⁹ Schubert, M.B.¹⁰ Ito, M.¹¹ Ro, K.¹² Uyama, H.¹³

8
- 2942530694
- A. Fejfar, T. Mates, O. Čertík, B. Rezek, J. Stuchlík, I. Pelant, and J. Kočka, J. Non-Cryst. Solids 338, 303 (2004).
- (2004) J. Non-Cryst. Solids , vol.338 , pp. 303
- Fejfar, A.¹ Mates, T.² Č³ Ertík, O.⁴ Rezek, B.⁵ Stuchlík, J.⁶ Pelant, I.⁷ Koč⁸ Ka, J.⁹

9
- 0032051207
- J. B. Boyce, P. Mei, R. T. Fulks, and J. Ho, Phys. Status Solidi A 166, 729 (1998).
- (1998) Phys. Status Solidi A , vol.166 , pp. 729
- Boyce, J.B.¹ Mei, P.² Fulks, R.T.³ Ho, J.⁴

10
- 0028766484
- M. Heintze, P. V. Santos, C. E. Nebel, and M. Stutzmann, Appl. Phys. Lett. 64, 3148 (1994).
- (1994) Appl. Phys. Lett. , vol.64 , pp. 3148
- Heintze, M.¹ Santos, P.V.² Nebel, C.E.³ Stutzmann, M.⁴

11
- 0003666038
- Noyes, Park Ridge, New Jersey
- S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Handbook of Plasma Processing Technology (Fundamentals Etching, Deposition and Surface Interactions) (Noyes, Park Ridge, New Jersey, 1989).
- (1989) Handbook of Plasma Processing Technology (Fundamentals Etching, Deposition and Surface Interactions)
- Rossnagel, S.M.¹ Cuomo, J.J.² Westwood, W.D.³

12
- 0032066785
- I. Beckers, N. H. Nickel, W. Pilz, and W. Fuhs, J. Non-Cryst. Solids 227, 847 (1998).
- (1998) J. Non-Cryst. Solids , vol.227 , pp. 847
- Beckers, I.¹ Nickel, N.H.² Pilz, W.³ Fuhs, W.⁴

13
- 0343363376
- L. J. Dimmey, P. L. Jones, and F. H. Cocks, Thin Solid Films 67, L13 (1980).
- (1980) Thin Solid Films , vol.67 , pp. 13
- Dimmey, L.J.¹ Jones, P.L.² Cocks, F.H.³

14
- 0001379717
- M. Taniguchi, M. Hirose, T. Hamasaki, and Y. Osaka, Appl. Phys. Lett. 37, 787 (1980).
- (1980) Appl. Phys. Lett. , vol.37 , pp. 787
- Taniguchi, M.¹ Hirose, M.² Hamasaki, T.³ Osaka, Y.⁴

15
- 0019697166
- T. Hirao, K. Mori, M. Kitagawa, S. Ishihara, M. Ohno, S. Nagata, and M. Watanabe, J. Appl. Phys. 52, 7453 (1981).
- (1981) J. Appl. Phys. , vol.52 , pp. 7453
- Hirao, T.¹ Mori, K.² Kitagawa, M.³ Ishihara, S.⁴ Ohno, M.⁵ Nagata, S.⁶ Watanabe, M.⁷

16
- 0004796896
- H. Fujiyama, T. Yamashita, T. Takahashi, and H. Matsuo, Appl. Phys. Lett. 50, 1322 (1987).
- (1987) Appl. Phys. Lett. , vol.50 , pp. 1322
- Fujiyama, H.¹ Yamashita, T.² Takahashi, T.³ Matsuo, H.⁴

17
- 0031345416
- S. C. Yang, Y. Maemura, K. Tazoe, Y. Matsuda, H. Fujiyama, Surf. Coat. Technol. 97, 366 (1997).
- (1997) Surf. Coat. Technol. , vol.97 , pp. 366
- Yang, S.C.¹ Maemura, Y.² Tazoe, K.³ Matsuda, Y.⁴ Fujiyama, H.⁵

18
- 0000471720
- A. Poruba, A. Fejfar, Z. Remeš, J. Špringer, M. Vaněček, J. Kočka, J. Meier, P. Torres, and A. Shah, J. Appl. Phys. 88, 148 (2000).
- (2000) J. Appl. Phys. , vol.88 , pp. 148
- Poruba, A.¹ Fejfar, A.² Remeš, Z.³ Špringer, J.⁴ Vaněč⁵ Ek, M.⁶ Koč⁷ Ka, J.⁸ Meier, J.⁹ Torres, P.¹⁰ Shah, A.¹¹

19
- 0034904138
- H. Fujiwara, M. Kondo, and A. Matsuda, Phys. Rev. B 63, 115306 (2001).
- (2001) Phys. Rev. B , vol.63 , pp. 115306
- Fujiwara, H.¹ Kondo, M.² Matsuda, A.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.