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Volumn 85, Issue 3, 2004, Pages 479-481
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Improved fill factors in amorphous silicon solar cells on zinc oxide by insertion of a germanium layer to block impurity incorporation
a
BP Solar
*
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
CONTACT RESISTANCE;
OPEN CIRCUIT VOLTAGE;
OPTICAL COUPLING;
PLASMA DISCHARGES;
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
ELECTRIC CONDUCTIVITY;
ELECTRIC POTENTIAL;
ELECTRIC RESISTANCE;
GERMANIUM;
IMPURITIES;
INTERFACES (MATERIALS);
PHOTOEMISSION;
PLASMAS;
QUANTUM EFFICIENCY;
REFRACTIVE INDEX;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DIODES;
SHORT CIRCUIT CURRENTS;
ZINC OXIDE;
SILICON SOLAR CELLS;
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EID: 4043157640
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1773372 Document Type: Article |
Times cited : (39)
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References (18)
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