Low-loss [formula omitted] thin films by inverted cylindrical magnetron sputtering

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 2830-2835

  Cukauskas, E J ^a   Kirchoefer, Steven W ^a   Pond, J M ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BARIUM; CAPACITANCE; COMPOSITE FILMS; DEPOSITION; GRAIN GROWTH; GRAIN SIZE AND SHAPE; MAGNETRONS; STRONTIUM; X RAY DIFFRACTION ANALYSIS;

ANISOTROPIC GRAIN GROWTH; COLUMNAR GRAIN STRUCTURE; CYLINDRICAL COMPOSITES; DEPOSITION CONDITIONS; ELECTRICAL CHARACTERISTIC; INVERTED CYLINDRICAL MAGNETRON; SUBSTRATE TEMPERATURE; VOLTAGE CHARACTERISTICS;

THIN FILMS;

EID: 56849102023     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.1289052     Document Type: Article

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