Model of leakage characteristics of (Ba,Sr)TiO3 thin films

Applied Physics Letters

Volumn 73, Issue 7, 1998, Pages 954-956

  Maruno, S ^a   Kuroiwa, T ^a   Mikami, N ^a   Sato, K ^a   Ohmura, S ^b   Kaida, M ^b   Yasue, T ^b   Koshikawa, T ^b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b OSAKA ELECTRO COMMUNICATION UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000289256     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122050     Document Type: Article

References (8)

1. N. Mikami, in Thin Film Ferroelectric Materials and Devices, edited by R. Ramesh (Kluwer, Boston, 1997), p. 43.
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5. T. Kuroiwa, Y. Tsunemine, T. Horikawa, T. Makita, J. Tanimura, N. Mikami, and K. Sato, Jpn. J. Appl. Phys., Part 1 33, 5087 (1994).
6. N. H. Chan, R. K. Sharma, and D. M. Smyth, J. Am. Ceram. Soc. 64, 556 (1981).
7. M. Copel, P. R. Duncombe, D. A. Neumayer, T. M. Shaw, and R. M. Tromp, Appl. Phys. Lett. 70, 3227 (1997).
8. E. H. Rhoderick, Metal-Semiconductor Contacts (Clarendon Press, Oxford, 1978), p. 113.