-
1
-
-
0006181847
-
-
J. C. Zolper, R. J. Shul, A. G. Baca, R. G. Wilson, S. Pearton, and R. A. Stall, Appl. Phys. Lett., 68, 2273 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 2273
-
-
Zolper, J.C.1
Shul, R.J.2
Baca, A.G.3
Wilson, R.G.4
Pearton, S.5
Stall, R.A.6
-
2
-
-
0027577673
-
-
I. Akasaki, H. Amano, N. Koide, M. Kotaki, and K. Manabe, Physica B, 185, 428 (1993).
-
(1993)
Physica B
, vol.185
, pp. 428
-
-
Akasaki, I.1
Amano, H.2
Koide, N.3
Kotaki, M.4
Manabe, K.5
-
3
-
-
0027187087
-
-
S. Nakamura, M. Senoh, and T. Mukai, Jpn. J. Appl. Phys., Part 2, 32, L8 (1993).
-
(1993)
Jpn. J. Appl. Phys., Part 2
, vol.32
, pp. 8
-
-
Nakamura, S.1
Senoh, M.2
Mukai, T.3
-
4
-
-
0029779805
-
-
S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku, and Y. Sugimoto, Jpn. J. Appl. Phys., Part 2, 35, L74 (1996).
-
(1996)
Jpn. J. Appl. Phys., Part 2
, vol.35
, pp. 74
-
-
Nakamura, S.1
Senoh, M.2
Nagahama, S.3
Iwasa, N.4
Yamada, T.5
Matsushita, T.6
Kiyoku, H.7
Sugimoto, Y.8
-
5
-
-
0033051026
-
-
J. Hu, T. W. Odom, and C. M. Lieber, Acc. Chem. Res., 32, 435 (1999).
-
(1999)
Acc. Chem. Res.
, vol.32
, pp. 435
-
-
Hu, J.1
Odom, T.W.2
Lieber, C.M.3
-
6
-
-
0030854137
-
-
W. Han, S. Fan, Q. Li, and Y. Hu, Science, 277, 1287 (1997).
-
(1997)
Science
, vol.277
, pp. 1287
-
-
Han, W.1
Fan, S.2
Li, Q.3
Hu, Y.4
-
7
-
-
27744449183
-
-
Z. Yu, Z. Yang, S. Wang, Y. Jin, J. G. Liu, M. Gong, and X. Sun, Chem. Vap. Deposition, 11, 433 (2005).
-
(2005)
Chem. Vap. Deposition
, vol.11
, pp. 433
-
-
Yu, Z.1
Yang, Z.2
Wang, S.3
Jin, Y.4
Liu, J.G.5
Gong, M.6
Sun, X.7
-
8
-
-
10644233797
-
-
C. Cao, X. Xiang, and H. Zhu, J. Cryst. Growth, 273, 375 (2005).
-
(2005)
J. Cryst. Growth
, vol.273
, pp. 375
-
-
Cao, C.1
Xiang, X.2
Zhu, H.3
-
9
-
-
0034805449
-
-
C. C. Chen, C. C. Yeh, C. H. Chen, M. Y. Yu, H. L. Liu, J. J. Wu, K. H. Chen, L. C. Chen, J. Y. Peng, and Y. F. Chen, J. Am. Chem. Soc., 123, 2791 (2001).
-
(2001)
J. Am. Chem. Soc.
, vol.123
, pp. 2791
-
-
Chen, C.C.1
Yeh, C.C.2
Chen, C.H.3
Yu, M.Y.4
Liu, H.L.5
Wu, J.J.6
Chen, K.H.7
Chen, L.C.8
Peng, J.Y.9
Chen, Y.F.10
-
10
-
-
33645018108
-
-
H. Qiu, C. Cao, X. Xiang, Y. Zhang, J. Li, and H. Zhu, J. Cryst. Growth, 290, 1 (2006).
-
(2006)
J. Cryst. Growth
, vol.290
, pp. 1
-
-
Qiu, H.1
Cao, C.2
Xiang, X.3
Zhang, Y.4
Li, J.5
Zhu, H.6
-
11
-
-
0042031107
-
-
J. Hu, Y. Bando, D. Golberg, and Q. Liu, Angew. Chem., Int. Ed., 42, 3493 (2003).
-
(2003)
Angew. Chem., Int. Ed.
, vol.42
, pp. 3493
-
-
Hu, J.1
Bando, Y.2
Golberg, D.3
Liu, Q.4
-
12
-
-
23244465659
-
-
M. C. Lu, Y. L. Chen, L. J. Chou, H. L. Hsiao, and A. B. Yang, Electrochem. Solid-State Lett., 8, G153 (2005).
-
(2005)
Electrochem. Solid-State Lett.
, vol.8
, pp. 153
-
-
Lu, M.C.1
Chen, Y.L.2
Chou, L.J.3
Hsiao, H.L.4
Yang, A.B.5
-
13
-
-
49749121461
-
-
Y. Inoue, A. Tajima, S. Takeda, H. Mimura, and S. Sakakibara, Phys. Status Solidi C, 4, 2366 (2007).
-
(2007)
Phys. Status Solidi C
, vol.4
, pp. 2366
-
-
Inoue, Y.1
Tajima, A.2
Takeda, S.3
Mimura, H.4
Sakakibara, S.5
-
14
-
-
33745455595
-
-
L. Yin, Y. Bando, M. Li, and D. Golberg, Small, 1, 1094 (2005).
-
(2005)
Small
, vol.1
, pp. 1094
-
-
Yin, L.1
Bando, Y.2
Li, M.3
Golberg, D.4
-
15
-
-
0037019380
-
-
H. Kim, D. Kim, and Y. Park, Adv. Mater. (Weinheim, Ger.), 14, 991 (2002).
-
(2002)
Adv. Mater. (Weinheim, Ger.)
, vol.14
, pp. 991
-
-
Kim, H.1
Kim, D.2
Park, Y.3
-
16
-
-
0001966460
-
-
H. Y. Peng, X. T. Zhou, N. Wang, Y. F. Zheng, L. S. Liao, W. S. Shi, C. S. Lee, and S. T. Lee, Chem. Phys. Lett., 327, 263 (2000).
-
(2000)
Chem. Phys. Lett.
, vol.327
, pp. 263
-
-
Peng, H.Y.1
Zhou, X.T.2
Wang, N.3
Zheng, Y.F.4
Liao, L.S.5
Shi, W.S.6
Lee, C.S.7
Lee, S.T.8
-
19
-
-
1842455253
-
-
Z. H. Lan, C. H. Liang, C. W. Hsu, C. T. Wu, H. M. Lin, S. Dhara, K. H. Chen, L. C. Chen, and C. C. Chen, Adv. Funct. Mater., 14, 233 (2004).
-
(2004)
Adv. Funct. Mater.
, vol.14
, pp. 233
-
-
Lan, Z.H.1
Liang, C.H.2
Hsu, C.W.3
Wu, C.T.4
Lin, H.M.5
Dhara, S.6
Chen, K.H.7
Chen, L.C.8
Chen, C.C.9
|