Evolution of the nanomorphology of photovoltaic polyfluorene blends: Sub-100 nm resolution with x-ray spectromicroscopy

Nanotechnology

Volumn 19, Issue 42, 2008, Pages

  McNeill, C R ^a   Watts, B ^b   Swaraj, S ^b   Ade, H ^b   Thomsen, L ^c   Belcher, W ^c   Dastoor, P C ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF NEWCASTLE   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; AMINES; BOUNDARY LAYER FLOW; CONJUGATED POLYMERS; EXCITONS; ISOMERS; LIGHT EMISSION; LUMINESCENCE; PHASE MODULATION; PHASE SEPARATION; PHOTOLUMINESCENCE; QUENCHING; SEMICONDUCTOR DOPING; SEMICONDUCTOR QUANTUM WELLS; SEPARATION; SIZE SEPARATION;

ANNEAL TEMPERATURES; AVERAGE DIAMETERS; BENZOTHIADIAZOLE; BULK STRUCTURES; COMPOSITIONAL FLUCTUATIONS; DI-AMINES; DO-MAINS; DOMAIN SIZES; EXCITON DIFFUSION LENGTHS; EXCITON DIFFUSIONS; FEATURE SIZES; IN COMPOSITIONS; LENGTH SCALES; MORPHOLOGICAL EVOLUTIONS; NANO MORPHOLOGIES; NANOMETRES; NM RESOLUTIONS; PHOTOLUMINESCENCE QUENCHING; POLYFLUORENE BLENDS; PURE PHASES; QUENCHING MODELS; RAYLEIGH; SPECTROMICROSCOPY; UNANNEALED FILMS; ZONE PLATES;

ANNEALING;

CHLOROFORM; DIAMINE DERIVATIVE; FLUORENE DERIVATIVE; POLYMER;

ARTICLE; DIFFUSION; EXCISION; NANOTECHNOLOGY; PHASE SEPARATION; PHOTOLUMINESCENCE; PRIORITY JOURNAL; RADIATION SCATTERING; ROENTGEN SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; TEMPERATURE SENSITIVITY;

EID: 56349119841     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/42/424015     Document Type: Article

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