ZnO thin films deposited by a CVT technique in closed ampoules

Materials Letters

Volumn 63, Issue 2, 2009, Pages 316-318

  Fu, Qiang ^a   Hu, Lizhong ^a   Yu, Dongqi ^a   Sun, Jingchang ^a   Zhang, Heqiu ^a   Huo, Bingzhi ^a   Zhao, Ziwen ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Chemical vapor transport; Various substrates; ZnO thin films

Indexed keywords

CORUNDUM; CRYSTALLINE MATERIALS; CRYSTALLITE SIZE; LIGHT EMISSION; LUMINESCENCE; METALLIC FILMS; MICROSCOPIC EXAMINATION; OPTICAL FILMS; OPTICAL MATERIALS; OPTICAL PROPERTIES; OXIDE MINERALS; QUARTZ; SAPPHIRE; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION; VARIABLE SPEED TRANSMISSIONS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC ALLOYS; ZINC OXIDE;

C -AXIS; CHEMICAL VAPOR TRANSPORT; CHEMICAL VAPOUR TRANSPORTS; CRYSTALLINE QUALITIES; GROWING PROCESSES; QUARTZ GLASSES; ROOM TEMPERATURES; SAPPHIRE SUBSTRATES; SI(100); SUBSTRATE TEMPERATURES; VARIOUS SUBSTRATES; X-RAY DIFFRACTIONS; XRD PATTERNS; ZNO THIN FILMS;

SUBSTRATES;

EID: 56349110986     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2008.10.027     Document Type: Article

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