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Volumn , Issue , 1997, Pages 151-154
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One-step selective growth of GaAs on V-groove patterned GaAs substrates using CBr4 and CCl4
a a b a a a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
ATMOSPHERIC PRESSURE;
BROMINE COMPOUNDS;
CHLORINE COMPOUNDS;
EPILAYERS;
GALLIUM ARSENIDE;
GROWTH RATE;
III-V SEMICONDUCTORS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING GALLIUM;
SEMICONDUCTOR JUNCTIONS;
SUBSTRATES;
ATMOSPHERIC-PRESSURE METALORGANIC CHEMICAL VAPOR DEPOSITION;
CARBON TETRABROMIDE;
EPITAXIAL TECHNOLOGIES;
GAAS SUBSTRATES;
LATERAL GROWTH RATES;
P-N JUNCTION;
QUANTUM STRUCTURE;
SELECTIVE GROWTH;
VANADIUM COMPOUNDS;
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EID: 56249135314
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ISCS.1998.711602 Document Type: Conference Paper |
Times cited : (3)
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References (9)
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