SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 69, Issue 7, 1996, Pages 955-956

Improvement of carrier capture efficiency of short-period GaAs/AlGaAs quantum wire array by a new lithography method

(4) Kim, Tae Geun a,b Kim, Eun Kyu a Min, Suk Ki a Park, Jung Ho b

a Korea Institute of Science and Technology (South Korea)

b Korea University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; ETCHING; HOLOGRAPHY; LITHOGRAPHY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

ALUMINUM GALLIUM ARSENIDE; CARRIER CAPTURE; CHEMICAL WET ETCHING; HOLOGRAPHY LITHOGRAPHY;

SEMICONDUCTOR QUANTUM WIRES;

EID: 0030213961 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.117093 Document Type: Article

Times cited : (11)

References (8)

1
- 36449004268
- S. Tsukamoto, Y. Nagamune, M. Nishoika, and Y. Arakawa, Appl. Phys. Lett. 63, 355 (1993).
- (1993) Appl. Phys. Lett. , vol.63 , pp. 355
- Tsukamoto, S.¹ Nagamune, Y.² Nishoika, M.³ Arakawa, Y.⁴

2
- 0029207969
- Y. Qian, Z. T. Xu, J. M. Zhang, L. H. Chen, Q. M. Wang, L. X. Zheng, and X. W. Hu, Electron. Lett. 31, 102 (1995).
- (1995) Electron. Lett. , vol.31 , pp. 102
- Qian, Y.¹ Xu, Z.T.² Zhang, J.M.³ Chen, L.H.⁴ Wang, Q.M.⁵ Zheng, L.X.⁶ Hu, X.W.⁷

3
- 21544450096
- M. Walther, E. Kapon, J. Christen, D. M. Hwang, and R. Bhat, Appl. Phys. Lett. 60, 521 (1992).
- (1992) Appl. Phys. Lett. , vol.60 , pp. 521
- Walther, M.¹ Kapon, E.² Christen, J.³ Hwang, D.M.⁴ Bhat, R.⁵

4
- 0000913508
- X-L. Wang, M. Ogura, and H. Matsuhata, Appl. Phys. Lett. 67, 804 (1995).
- (1995) Appl. Phys. Lett. , vol.67 , pp. 804
- Wang, X.-L.¹ Ogura, M.² Matsuhata, H.³

5
- 85033012893
- Santa Clara, U.S.A. (to be published)
- T. G. Kim, K. H. Park, S. M. Hwang, S. I. Kim, C. S. Son, E. K. Kim, J. H. Park, and S. K. Min, Proceedings of SPIE's 1996 International Symposium on Microlithography, Santa Clara, U.S.A. 1996 (to be published); T. G. Kim, E. K. Kim, C. S. Son, Y. Kim, S. I. Kim, S. K. Min, and J. H. Park, Semicon. Sci. Technol. (1996) (to be published).
- (1996) Proceedings of SPIE's 1996 International Symposium on Microlithography
- Kim, T.G.¹ Park, K.H.² Hwang, S.M.³ Kim, S.I.⁴ Son, C.S.⁵ Kim, E.K.⁶ Park, J.H.⁷ Min, S.K.⁸

6
- 85033019976
- to be published
- T. G. Kim, K. H. Park, S. M. Hwang, S. I. Kim, C. S. Son, E. K. Kim, J. H. Park, and S. K. Min, Proceedings of SPIE's 1996 International Symposium on Microlithography, Santa Clara, U.S.A. 1996 (to be published); T. G. Kim, E. K. Kim, C. S. Son, Y. Kim, S. I. Kim, S. K. Min, and J. H. Park, Semicon. Sci. Technol. (1996) (to be published).
- (1996) Semicon. Sci. Technol.
- Kim, T.G.¹ Kim, E.K.² Son, C.S.³ Kim, Y.⁴ Kim, S.I.⁵ Min, S.K.⁶ Park, J.H.⁷

7
- 0029218919
- M. S. Kim, Y. Kim, M. S. Lee, Y. J. Park, S. I. Kim, and S. K. Min, J. Cryst. Growth 146, 482 (1995).
- (1995) J. Cryst. Growth , vol.146 , pp. 482
- Kim, M.S.¹ Kim, Y.² Lee, M.S.³ Park, Y.J.⁴ Kim, S.I.⁵ Min, S.K.⁶

8
- 85033011148
- unpublished
- T. G. Kim, E. K. Kim, S. M. Hwang, H. S. Im, S. K. Min, and J. H. Park (unpublished).
- Kim, T.G.¹ Kim, E.K.² Hwang, S.M.³ Im, H.S.⁴ Min, S.K.⁵ Park, J.H.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.