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Volumn 93, Issue 1, 2009, Pages 19-24

Angle-dependent XPS analysis of silicon nitride film deposited on screen-printed crystalline silicon solar cell

Author keywords

Angle dependent XPS; Silicon nitride; Silicon solar cell

Indexed keywords

ANTIREFLECTION COATINGS; CARBON; CAVITY RESONATORS; CELLS; CONCENTRATION (PROCESS); CONTAMINATION; CRYSTALLINE MATERIALS; CYTOLOGY; MICROSCOPIC EXAMINATION; NITRIDES; NONMETALS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PHOTOVOLTAIC CELLS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SILICON SOLAR CELLS; SOLAR CELLS; SOLAR ENERGY; SOLAR EQUIPMENT; STOICHIOMETRY; SWITCHING CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 55949129114     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.02.009     Document Type: Article
Times cited : (34)

References (15)
  • 3
    • 55949092821 scopus 로고    scopus 로고
    • Priyanka, M. Lal, S.N. Singh, Effect of localized shunt resistance on spectral response of silicon solar cell, in: Proceedings of the IWPSD, 13-17 December 2005, NPL, New Delhi, India, vol. 1, pp. 201-205.
    • Priyanka, M. Lal, S.N. Singh, Effect of localized shunt resistance on spectral response of silicon solar cell, in: Proceedings of the IWPSD, 13-17 December 2005, NPL, New Delhi, India, vol. 1, pp. 201-205.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.