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Volumn 93, Issue 1, 2009, Pages 19-24
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Angle-dependent XPS analysis of silicon nitride film deposited on screen-printed crystalline silicon solar cell
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Author keywords
Angle dependent XPS; Silicon nitride; Silicon solar cell
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Indexed keywords
ANTIREFLECTION COATINGS;
CARBON;
CAVITY RESONATORS;
CELLS;
CONCENTRATION (PROCESS);
CONTAMINATION;
CRYSTALLINE MATERIALS;
CYTOLOGY;
MICROSCOPIC EXAMINATION;
NITRIDES;
NONMETALS;
OXYGEN;
PHOTOELECTRON SPECTROSCOPY;
PHOTOVOLTAIC CELLS;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON NITRIDE;
SILICON SOLAR CELLS;
SOLAR CELLS;
SOLAR ENERGY;
SOLAR EQUIPMENT;
STOICHIOMETRY;
SWITCHING CIRCUITS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ANGLE-DEPENDENT XPS;
ATOMIC COMPOSITIONS;
CIRCUIT VOLTAGES;
CRYSTALLINE SILICON SOLAR CELLS;
FILL FACTORS;
HIGHER CONCENTRATIONS;
IN CELLS;
IN PROCESSING;
ORGANIC SUBSTANCES;
OXYGEN CONCENTRATIONS;
OXYGEN CONTAMINATIONS;
PEAK POSITIONS;
PHOTOVOLTAIC PERFORMANCES;
SURFACE CONTAMINATIONS;
TEXTURIZATION;
X-RAY PHOTOELECTRON SPECTROSCOPIES;
XPS ANALYSES;
SILICON;
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EID: 55949129114
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2008.02.009 Document Type: Article |
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Times cited : (35)
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References (15)
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