Nitridation of Si(100) surface with NH 3

Applied Surface Science

Volumn 130-132, Issue , 1998, Pages 107-111

  Ishidzuka, S ^a   Igari, Y ^a   Takaoka, T ^a   Kusunoki, I ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ammonia (M1c12); Scanning electron microscopy (S2ej12); Silicon (M1a90); Silicon Nitride (M1b78); X ray photoelectron spectroscopy (S2pe12)

Indexed keywords

AMMONIA; CRYSTAL ORIENTATION; FILM GROWTH; HIGH TEMPERATURE EFFECTS; NITRIDING; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SURFACE PHENOMENA; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

GAUSSIAN COMPONENTS;

SEMICONDUCTING SILICON;

EID: 0032098608     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00034-8     Document Type: Article

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