Spatially localized photoluminescence at 1.5 micrometers wavelength in direct laser written optical nanostructures

Advanced Materials

Volumn 20, Issue 21, 2008, Pages 4097-4102

  Wong, Sean ^a   Kiowski, Oliver ^a   Kappes, Manfred ^a   Lindner, Jörg K N ^b   Mandal, Nirajan ^c   Peiris, Frank C ^c   Ozin, Geoffrey A ^d   Thiel, Michael ^e   Braun, Markus ^a,e   Wegener, Martin ^a,e   Von Freymann, Georg ^a,e  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF AUGSBURG   (Germany)

^c KENYON COLLEGE   (United States)

^d UNIVERSITY OF TORONTO   (Canada)

^e UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ARSENIC; CONCENTRATION (PROCESS); DOPING (ADDITIVES); ERBIUM; LIGHT EMISSION; LUMINESCENCE; MICROMETERS; MONOMERS; NANOSTRUCTURES; OPTICAL PROPERTIES; PHOTORESISTS; POLYMERS; REFRACTIVE INDEX; SUGAR (SUCROSE); SURFACE TREATMENT; THICK FILMS; THICKNESS MEASUREMENT;

3D NANOSTRUCTURES; ACCURATE CONTROLS; DIRECT LASER WRITINGS; DOPANT SOURCES; ERBIUM-DOPED; OPTICAL NANOSTRUCTURES; PHOTODARKENING; POLYMERIZATION PROCESSES; STOCHIOMETRY; SYNTHESIS OF; TELECOMMUNICATION WAVELENGTHS; THICKNESS OF THE FILMS;

PHOTORESISTORS;

EID: 55749115430     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200801508     Document Type: Article

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