Highly selective wet etch for high-resolution three-dimensional nanostructures in arsenic sulfide all-inorganic photoresist

Chemistry of Materials

Volumn 19, Issue 17, 2007, Pages 4213-4221

  Wong, Sean H ^a,b   Thiel, Michael ^b   Brodersen, Peter ^c   Fenske, Dieter ^a,b   Ozin, Geoffrey A ^c   Wegener, Martin ^a,b   Von Freymann, Georg ^a,b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF KARLSRUHE   (Germany)

^c UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC COMPOUNDS; ELECTROCHEMICAL ETCHING; ELECTRONIC STRUCTURE; OPTICAL SYSTEMS; PHOTOPOLYMERS; PHOTORESISTS;

ARSENIC SULFIDE; INORGANIC PHOTORESISTS; LASER WRITING; OPTICAL STRUCTURES; THREE-DIMENSIONAL NANOSTRUCTURES;

NANOSTRUCTURES;

EID: 34548294928     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm070756y     Document Type: Article

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