NI(PT)SI thermal stability improvement by carbon implantation

ECS Transactions

Volumn 13, Issue 1, 2008, Pages 397-404

  Mertens, S ^a   Hoffmann, T Y ^a   Vrancken, C ^a   Jakschik, S ^b   Richard, O ^a   Verleysen, E ^a   Bender, H ^a   Zhao, C ^a   Vandervorst, W ^a   Absil, P ^a   Lauwers, A ^a  

^a IMEC   (Belgium)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

C FILMS; CARBON IMPLANTATIONS; CARBON INCORPORATIONS; CRYSTALLINITY; DEGRADATION MECHANISMS; DISILICIDE; HIGH TEMPERATURES; NI SILICIDES; NUCLEATION TEMPERATURES; PHASE FORMATIONS; PMOS DEVICES; THERMAL STABILITIES; X-RAY DIFFRACTIONS;

CARBON; DEGRADATION; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; LOGIC GATES; MICROSCOPIC EXAMINATION; MOLECULAR BEAM EPITAXY; NICKEL ALLOYS; OPTICAL WAVEGUIDES; PHOTODEGRADATION; PLATINUM; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; THERMODYNAMIC STABILITY; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

PHASE STABILITY;

EID: 55649118408     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2911522     Document Type: Conference Paper

References (7)

1. J.A. Kittl, A. Lauwers, O. Chamirian, M. Van Dal, A. Akheyar, M. De Potter, R. Lindsay and K. Maex, Microelectronic Engineering 70 (2003) 158-165.
2. A. Lauwers, J. A. Kittl, M. J. H. Van Dal, O. Charnirian, M. A. Pawlak, M. De Potter, R. Lindsay, T. Raymakers, X. Pages, B. Mebarki, T. Mandrekar and K. Maex, Materials Science and Engineering B 114-115 (2004) 29-41.
3. D. Mangelinck, J. Y. Dai, J. S. Pan and S. K. Lahiri, Appl. Phys. Lett. 75, 1736 (1999).
4. S. Mertens, Y. Cho, F. Nouri, R. Schreutelkamp, Y. Kim, P. Verheyen, J. Steenbergen, C. Vrancken, H. Bender, O. Richard, B. Van Daele, W. Vandervorst, L. Geenen, P. Absil, S. Kubicek, C. Demeurisse, Z. Tökei and A. Lauwers, ECS Transactions, 3 (2) (2006) 139.
5. V. Machkaoutsan, S. Mertens, M. Bauer, A. Lauwers, K. Verheyden, K. Vanormelingen, P. Verheyen, R. Loo, M. Caymax, S. Jakschik, D. Theodore, P. Absil, S. G. Thomas, E. H. A. Granneman, Microelectronic Engineering 84 (2007) 2542-2546.
6. O. Nakatsuka, K. Okubo, A. Sakai, M. Ogawa, Y. Yasuda and S. Zaima, Microelectronic Engineering 82 (2005) 479-484.
7. E. Augendre, B. J. Pawlak, S. Kubicek, T. Hoffmann, T. Chiarella, C. Kerner, S. Severi, A. Falepin, J. Ramos, A. De Keersgieter, P. Eyben, D. Vanhaeren, W. Vandervorst, M. Jurczak, P. Absil and S. Biesemans, Solid State Electronics 51 (2007) 1432-1436.