Stress control in AIN and Mo films for electro-acoustic devices

2008 IEEE International Frequency Control Symposium, FCS

Volumn , Issue , 2008, Pages 629-633

  Felmetsger, Valery V ^a   Laptev, Pavel N ^a  

^a Tegal Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL FILTERS; CRYSTAL OSCILLATORS; ELECTRIC DISCHARGES; ELECTRON GUNS; MAGNETRON SPUTTERING; MAGNETRONS; MOLYBDENUM; PIEZOELECTRICITY; POWDERS; REACTIVE SPUTTERING; TENSILE STRESS; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

AIN FILMS; ALN FILMS; BOTTOM ELECTRODES; C -AXIS; DEPOSITION PROCESSES; DISCHARGE CURRENTS; DUAL CATHODES; EFFECTIVE STRESSES; ELECTROACOUSTIC DEVICES; FBAR FILTERS; FILM DEPOSITIONS; FILM STACKS; INTRINSIC STRESSES; REACTIVE SPUTTERING PROCESSES; RESONATING SENSORS; STRESS CONTROLS; SUBSTRATE BIASES; TECHNOLOGICAL SOLUTIONS; TEXTURE DETERIORATIONS;

CRYSTAL ORIENTATION;

EID: 55649096652     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/FREQ.2008.4623076     Document Type: Conference Paper

References (10)

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