Dual cathode DC-RF and MF-RF coupled S-Guns for reactive sputtering

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 403-408

  Felmetsger, V ^a   Laptev, P ^a  

^a Tegal Company   (United States)

Author keywords

AlN; Magnetron; Reactive sputtering; Si3N4; SiO2; Thin films

Indexed keywords

ALUMINUM NITRIDE; FREQUENCIES; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL PROPERTIES; SILICA; SILICON NITRIDE; STRESSES; SUBSTRATES; THIN FILMS;

PALSMA IGNITION; REACTIVE SPUTTERING; STRUCTURE CHARACTERISTICS;

SPUTTER DEPOSITION;

EID: 2442449073     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.007     Document Type: Article

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