300 mm reference wafer fabrication by using direct laser lithography

Review of Scientific Instruments

Volumn 79, Issue 10, 2008, Pages

  Rhee, Hyug Gyo ^a   Kim, Dongik ^a   Hong, Seung Ki ^a   Lee, Yun Woo ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; LITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SILICON;

LASER LITHOGRAPHIES; PATTERN SIZES; POSITION UNCERTAINTIES; REFERENCE WAFERS;

SILICON WAFERS;

EID: 55349135210     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2999827     Document Type: Conference Paper

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