SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 47, Issue 8 PART 1, 2008, Pages 6442-6447

Effect of reaction temperature on growth of organosilane self-assembled monolayers

(4) Lee, Sunhyung a Ishizaki, Takahiro b Saito, Nagahiro c Takai, Osamu c

a SHINSHU UNIVERSITY (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

c NAGOYA UNIVERSITY (Japan)

Author keywords

Atomic force microscope; Grazing incidence X ray diffraction; Organosilane self assembled monolayer; Self organization

Indexed keywords

ACOUSTIC MICROSCOPES; AMPLITUDE MODULATION; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; DIFFRACTION; ELECTRON ENERGY LEVELS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; MISSILE BASES; MONOLAYERS; ORGANIC POLYMERS; PHOTOELECTRON SPECTROSCOPY; SELF ASSEMBLED MONOLAYERS; SILANES; SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; VAPORS; X RAY ANALYSIS; X RAY DIFFRACTION;

AMORPHOUS STRUCTURES; ATOMIC FORCE MICROSCOPE; ATOMIC FORCES; CRYSTALLINE PEAKS; CRYSTALLINE STATES; DOMAIN STRUCTURES; FOURIER TRANSFORM INFRARED; GRAZING INCIDENCE X-RAY DIFFRACTION; GRAZING INCIDENCES; GROWTH MECHANISMS; GROWTH PROCESSES; HIGHER TEMPERATURES; IR MEASUREMENTS; IR SPECTRUM; LIQUID PHASE; OCTADECYLTRICHLOROSILANE; ORGANOSILANE SELF-ASSEMBLED MONOLAYER; OTS MONOLAYERS; PACKING DENSITIES; REACTION TEMPERATURES; SELF ORGANIZATIONS; SELF-ORGANIZATION; SILOXANE BONDS; TEMPERATURE RANGES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 55149108346 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.6442 Document Type: Article

Times cited : (8)

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