Antireflection coating formed by plasma-enhanced chemical-vapor deposition for terahertz-frequency germanium optics

Applied Optics

Volumn 42, Issue 19, 2003, Pages 4045-4048

  Hosako, Iwa ^a  

^a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; LOW TEMPERATURE EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES;

DEPOSITED LAYERS;

OPTICAL COATINGS;

EID: 0042810712     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.004045     Document Type: Article

References (12)

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