Low-loss silicon oxynitride waveguides and branches for the 850-nm-wavelength region

Japanese Journal of Applied Physics

Volumn 47, Issue 8 PART 2, 2008, Pages 6739-6743

  Tsuchizawa, Tai ^a   Watanabe, Toshifumi ^a   Yamada, Koji ^a   Fukuda, Hiroshi ^a   Itabashi, Seiichi ^a   Fujikata, Junichi ^b   Gomyo, Akiko ^b   Ushida, Jun ^b   Okamoto, Daisuke ^b   Nishi, Kenichi ^b   Ohashi, Keishi ^b  

^a NTT CORPORATION   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Branch; Multimode interference (MMI); On chip optical interconnect; Optical waveguide; Plasma enhanced CVD; Propagation loss; Si photodiode; Silicon oxynitride (SiON); Surface plasmon antenna

Indexed keywords

ANTENNAS; ELECTRIC LOSSES; ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA; INTEGRATED OPTICS; INTEGRATED OPTOELECTRONICS; NITRIDES; OPTICAL INTERCONNECTS; OPTICAL WAVEGUIDES; PHOTODIODES; PLASMA DEPOSITION; PLASMAS; PLASMONS; SILICON; SILICON NITRIDE; WAVEGUIDES;

BRANCH; MULTIMODE INTERFERENCE (MMI); ON-CHIP OPTICAL INTERCONNECT; PROPAGATION LOSS; SI PHOTODIODE; SILICON OXYNITRIDE (SION); SURFACE PLASMON ANTENNA;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 55149106337     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.6739     Document Type: Article

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