Optical interconnect technologies for high-speed VLSI chips using silicon nano-photonics

Digest of Technical Papers - IEEE International Solid-State Circuits Conference

Volumn , Issue , 2006, Pages

  Ohashi, Keishi ^a   Fujikata, Junichi ^a   Nakada, Masafumi ^a   Ishi, Tsutomu ^a   Nishi, Kenichi ^a   Yamada, Hirohito ^a   Fukaishi, Muneo ^a   Mizuno, Masayuki ^a   Nose, Koichi ^a   Ogura, Ichiro ^a   Urino, Yutaka ^a   Baba, Toshio ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRIC RESISTANCE; NANOELECTRONICS; PHOTODIODES; PHOTONICS; VLSI CIRCUITS;

ELECTROOPTICAL COEFFICIENT; JUNCTION CAPACITANCE;

OPTICAL INTERCONNECTS;

EID: 39749119449     PISSN: 01936530     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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3. J. Fujikata et. al., "Highly Enhanced Speed and Efficiency of Si Nano-Photodiode with a Surface-Plasmon Antenna," Extended Abstracts of SSDM 2005, E-3-3, 2005.
4. J. D. Schaub et. al., "Resonant-Cavity-Enhanced High-Speed Si Photodiode Grown by Epitaxial Lateral Overgrowth," IEEE Photon. Technol. Lett., vol. 11, pp. 1647-1649, 1999.
5. C. D. Debae et. al., "Receiver-Less Optical Clock Injection for Clock Distribution Networks," IEEE J. Sel. Top. Quantum Electron., vol. 9, no., pp. 400-409, 2003.
6. 3 (x = 0, 0.3, 0.6) Films Prepared by Aerosol Deposition," Jap. J. Appl. Phys., vol. 44, pp. L1088-L1090, 2005.