Cleaning characteristics of contaminated imaging optics using 172 nm radiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6150-6154

  Tanaka, Kazuumi ^a,c   Hamamoto, Kazuhiro ^b,c   Sakaya, Noriyuki ^b,c   Hosoya, Morio ^b,c   Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b HOYA CORPORATION   (Japan)

^c Kawaguchi Center Bldg ^*  (Japan)

Author keywords

172nm excimer lamp; Contamination; EUVL; Radical oxygen; Surface damage; Vacuum ultraviolet light

Indexed keywords

CONTAMINATION; EXTREME ULTRAVIOLET LITHOGRAPHY; FLOW RATE; OXYGEN; ULTRAVIOLET RADIATION;

EXCIMER LAMPS; RADICAL OXYGEN; SCHWARZCHILD OPTICS; SURFACE DAMAGE; VACUUM ULTRAVIOLET LIGHT;

EXCIMER LASERS;

EID: 34648815951     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6150     Document Type: Article

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