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Surface and Coatings Technology

Volumn 183, Issue 1, 2004, Pages 62-68

Hard nanocomposite Ti-Cu-N films prepared by d.c. reactive magnetron co-sputtering

(5) Li, Z G a Miyake, S a Kumagai, M b Saito, H c Muramatsu, Y c

a OSAKA UNIVERSITY (Japan)

b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

c Kanagawa High Technology Foundation (Japan)

Author keywords

Co sputtering; Friction coefficient; Hardness; Nanocomposite

Indexed keywords

DEPOSITION; FRICTION; MICROHARDNESS; MICROSTRUCTURE; MORPHOLOGY; SPUTTERING; THIN FILMS;

BIASED SUBSTRATES; COATINGS TECHNOLOGY; DRY FRICTION COEFFICIENT; TRIBOLOGICAL PROPERTIES;

NANOSTRUCTURED MATERIALS;

NANOCOMPOSITE;

EID: 2342537844 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2003.09.051 Document Type: Article

Times cited : (62)

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