Nanodimple arrays fabricated on SiO2 surfaces by wet etching through block copolymer thin films

Japanese Journal of Applied Physics

Volumn 47, Issue 6 PART 2, 2008, Pages 5039-5041

  Watanabe, Ryoko ^a   Kamata, Kaori ^a,b   Iyoda, Tomokazu ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Block copolymer; Dimple array; Liquid crystalline; Microphase separated structure; Nanotemplate; PEO cylinder; Self assembly; Wet etching

Indexed keywords

ABS RESINS; ANNEALING; BLOCK COPOLYMERS; COPOLYMERIZATION; CYLINDERS (SHAPES); ETCHING; ETHYLENE; FIELD EMISSION; MICROPHASE SEPARATION; MICROSCOPES; PERIODIC STRUCTURES; PLASTIC PRODUCTS; PNEUMATIC CONTROL EQUIPMENT; POLYETHYLENE OXIDES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SEPARATION; SILICON; SILICON COMPOUNDS; SILICON WAFERS; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; WET ETCHING;

DIMPLE ARRAY; MICROPHASE-SEPARATED STRUCTURE; NANOTEMPLATE; PEO CYLINDER; SELF-ASSEMBLY;

POLYMERS;

EID: 55049087894     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.5039     Document Type: Article

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