Immersion exposure tool for the 45nm HP mass production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Kubo, Hiroaki ^a   Hata, Hideo ^a   Sakai, Fumio ^a   Deguchi, Nobuyoshi ^a   Iwanaga, Takehiko ^a   Ebihara, Takeaki ^a  

^a CANON INC   (Japan)

Author keywords

Equipment; Exposure tool; High refractive index immersion; Immersion lithography; In situ PMI; Lens aberration; Polarized illumination

Indexed keywords

ABERRATIONS; LIGHT POLARIZATION; OPTIMIZATION; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS); TEMPERATURE CONTROL;

EXPOSURE TOOL; HIGH REFRACTIVE INDEX IMMERSION; IMMERSION LITHOGRAPHY; IN-SITU PMI; LENS ABERRATION; POLARIZED ILLUMINATION;

LENSES;

EID: 35148850164     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711360     Document Type: Conference Paper

References (7)

1. T. Yoshihara, et al., New projection optics and aberration control system for the 45nm node, Proc. SPIE 6520-73 (2007)
2. K. Mori, et al., Impact of illumination performance on hyper-NA imaging for 45-nm node, Proc. SPIE 6520-117 (2007)
3. Y. Ohsaki, et al., A new on-machine measurement system to measure wavefront aberrations of projection optics with hyper-NA, Proc. SPIE 6154-77 (2006)
4. K. Tsujita, et al., Illumination optimization with actual information of exposure tool and resist process, Proc. SPIE 6520-116 (2007)
5. K. Nakano, et al., Development Status of a 193-nm Immersion Scanner, 2nd International Symposium on Immersion Lithography (2005)
6. M. Kobayashi, et al., Contamination and particle control system in the immersion exposure tool, Proc. SPIE 6520-40 (2007)
7. Y. Sekine, et al., Feasibility of 37-nm half-pitch with ArF high-index immersion lithography, Proc. SPIE 6520-61 (2007)