Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Sekine, Yoshiyuki ^a   Kawashima, Miyoko ^a   Sakamoto, Eiji ^a   Sakai, Keita ^a   Yamada, Akihiro ^a   Honda, Tokuyuki ^a  

^a CANON INC   (Japan)

Author keywords

High index fluid; High index lens material; Immersion lithography; Thermal aberration

Indexed keywords

FLUID MECHANICS; FUSED SILICA; NUMERICAL ANALYSIS; OPTICAL MATERIALS; REFRACTIVE INDEX;

HIGH INDEX FLUID; HIGH INDEX LENS MATERIAL; IMMERSION LITHOGRAPHY; THERMAL ABERRATION;

PHOTOLITHOGRAPHY;

EID: 35148867543     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711940     Document Type: Conference Paper

References (6)

1. T. Miyamatsu et al., Proc. SPIE 5733, 10 (2005)
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3. J. Santillan et al., Proc. SPIE 6154, 61544Q-1 (2006)
4. rd International Symposium on Immersion Lithography
5. J. H. Burnett and S. G. Kaplan, J. Microlith. Microfab. Microsyst. 3, 68 (2004)
6. J. H. Burnett et al., Proc SPIE 6154, 615418-1 (2006)