Determination of negative-ion density in an electron cyclotron resonance C4F8 plasma

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 1065-1069

  Shindo, M ^a   Hiejima, S ^a   Ueda, Y ^a   Kawakami, S ^b   Ishii, N ^b   Kawai, Y ^a  

^a Grad Sch Eng Sci   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

ECR plasma; Fluorocarbon plasma; Heated Langmuir probe; Negative ion

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON DENSITY MEASUREMENT; FLUOROCARBONS; INTERFEROMETERS; NEGATIVE IONS; PLASMA PROBES;

ELECTRON CYCLOTRON RESONANCE (ECR) PLASMAS; LANGMUIR PROBES;

PLASMAS;

EID: 0033326961     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00284-4     Document Type: Article

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