Measurements of negative ion density in O2/Ar electron cyclotron resonance plasma

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 355-359

  Shindo, M ^a   Kawai, Y ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Electron cyclotron resonance plasma; Ion acoustic waves; Langmuir probe; Negative ion density; Oxygen plasma

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON CYCLOTRON RESONANCE; ION ACOUSTIC WAVES; MAGNETIC FIELD EFFECTS; NEGATIVE IONS; PLASMA APPLICATIONS;

ELECTRON SATURATION CURRENTS; ION ACOUSTIC WAVES (IAW);

ELECTRON DENSITY MEASUREMENT;

PLASMA TREATMENT;

EID: 0035386845     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01073-8     Document Type: Article

References (23)