Structural modifications of SiOx/DLC films by thermal annealing

Journal of Ceramic Processing Research

Volumn 5, Issue 3, 2004, Pages 269-273

  Yang, Won Jae ^a   Niihara, Koichi ^b   Auh, Keun Ho ^a  

^a Hanyang University   (South Korea)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Hardness; Microstructure; Raman; SiOx DLC; Thermal annealing

Indexed keywords

CARBON; DIAMOND; HYDROGEN; OXYGEN; SILICON; SILICON DIOXIDE;

ARTICLE; ATOM; CHEMICAL MODIFICATION; FILM; HEAT TREATMENT; RAMAN SPECTROMETRY; STRUCTURE ANALYSIS;

EID: 5444270618     PISSN: 12299162     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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