Antiferromagnetically coupled CoFeB/Ru/CoFeB trilayers

Applied Physics Letters

Volumn 85, Issue 11, 2004, Pages 2020-2022

  Wiese, N ^a,b   Dimopoulos, T ^a   Ruhrig M ^a   Wecker, J ^a   Bruckl M ^b   Reiss, G ^b  

^a SIEMENS AG   (Germany)

^b BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ANTIFERROMAGNETIC MATERIALS; COERCIVE FORCE; CRYSTALLIZATION; DATA STORAGE EQUIPMENT; MAGNETIC COUPLINGS; MAGNETORESISTANCE; MULTILAYERS; OXIDATION; THERMAL EFFECTS; THICKNESS MEASUREMENT; TUNNEL JUNCTIONS;

ARTIFICIAL FERRIMAGNET; STRAIN SENSORS; TUNNEL BARRIER; TUNNEL MAGNETORESISTANCE (TMR);

COBALT COMPOUNDS;

EID: 5444266596     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1792375     Document Type: Article

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