Magnetization reversal and domain structure of antiferromagnetically coupled submicron elements

Journal of Applied Physics

Volumn 93, Issue 10 2, 2003, Pages 7441-7443

  Tezuka, N ^a,b   Koike, N ^a   Inomata, K ^a,b   Sugimoto, S ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; HYSTERESIS; KERR MAGNETOOPTICAL EFFECT; MAGNETIC DOMAINS; MAGNETIC FILMS; MAGNETIZATION; MAGNETOMETERS; MONOLAYERS; REMANENCE; SPUTTER DEPOSITION;

MAGNETIC FORCE MICROSCOPY (MFM); MAGNETIC SWITCHING;

ANTIFERROMAGNETIC MATERIALS;

EID: 0037637469     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1539074     Document Type: Conference Paper

References (8)

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8. A commercial micromagnetic program (LLG Micromagnetic Simulator™) was used.