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Volumn 99, Issue 3, 2006, Pages
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Silicide phase formation in Ni/Si system: Depth-resolved positron annihilation and Rutherford backscattering study
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Author keywords
[No Author keywords available]
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Indexed keywords
NICKEL;
POSITRON ANNIHILATION SPECTROSCOPY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTOR JUNCTIONS;
SILICON;
SILICIDATION;
SILICIDE;
THIN FILMS;
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EID: 33645497937
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2168296 Document Type: Article |
Times cited : (10)
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References (20)
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