Magnetron-AF plasma polymerization

Plasma Processes and Polymers

Volumn 5, Issue 3, 2008, Pages 215-227

  Yasuda, Hirotsugu ^a  

^a University of Missouri   (United States)

Author keywords

Cathode electron avalanche; Magnetron plasma polymerization coating; Magnetron sputter coating; Magnetron AF plasma polymerization; Sputtering

Indexed keywords

ABS RESINS; AVALANCHES (SNOWSLIDES); CHEMICAL REACTIONS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; ELECTROLYSIS; IONIZATION OF GASES; MAGNETIC DOMAINS; MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MAGNETRONS; MONOMERS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SNOW;

AUDIO FREQUENCIES; BREAKDOWN VOLTAGES; CURRENT PROCESSES; DISSOCIATION GLOWS; ELECTRODE SURFACES; GAS PHASES; INDUSTRIAL SCALES; MAGNETRON PLASMA POLYMERIZATION COATING; PLASMA POLYMERS; PRESSURE DOMAINS;

POLYMERIZATION;

EID: 54149101327     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200700116     Document Type: Article

References (23)

1. D. L. Ross, RCA Rev. 1978, 39, 136.
2. H. Yasuda, "Luminous Chemical Vapor Deposition & Interface Engineering", Marcel Dekker, New York, NY 2004.
3. Y. Matsuzawa, H. Yasuda, "Electron Dynamics of Low-pressure Deposition Plasma", ISPC-18, Kyoto, Japan 2007.
4. H. Yasuda, Macromol. Biosci. 2006, 6, 121.
5. H. Yasuda, "Plasma Polymerization", Academic Press, San Diego, CA 1985.
6. H. Yasuda, Plasma Proc. Polym. 2005, 2, 293.
7. Masayo Miyama, Hirotsugu Yasuda, J. Appl. Polym. Sci. 1998, 70, 237.
8. H. Yasuda, Y. Matsuzawa, Plasma Proc. Polym. 2005, 2, 507.
9. J. S. E. Townsend, "Electricity in Gases", Clarendon Press, Oxford 1915.
10. S. C. Brown, "Introduction to Electrical Discharges in Gases", John Wiley, NY 1966.
11. H. Yasuda, Q. Yu, Plasma Chem. Plasma Proc. 2004, 24, 325.
12. H. Yasuda, Plasma Proc. Polym. 2007, 4, 347.
13. H. Yasuda, L. Ledernez, F. Olcaytug, G. Urban, "Industrial Operation of Magnetron Plasma Polymerization for Biocompatible Nanofilm Encapsulation of Contact Lens", ISPC-18 meeting, August 2007.
14. F. Paschen, Annal. Phys. 1889, 273, 69.
15. T. Williams, M. W. Hayes, Nature 1966, 209, 769.
16. A. R. Westwood, Eur. Polym. J. 1971, 7, 363.
17. Q. S. Yu, C. Huang, H. K. Yasuda, J. Polym. Sci., Part A: Polym. Chem. 2004, 42, 1042.
18. H. Yasuda, Q. Yu, J. Vac. Sci. Technol. A 2004, 22, 472.
19. W. H. Tao, M. A. Prelas, H. K. Yasuda, J. Vac. Sci. Technol. A 1996, 14, 2113.
20. Q. S. Yu, H. K. Yasuda, Plasmas Polym. 2002, 7, 41.
21. D. L. Cho, Y. S. Yeh, H. Yasuda, J. Vac. Sci. Technol. A 1989, 7, 2960.
22. J. L. Vossen, J. J. Cuomo, "Thin Film Processes", J. L. Vossen, W. Kern, Eds., Academic Press, New York 1978.
23. K. Wasa, S. Hayakawa, "Handbook of Sputter Deposition Technology", Noyes Publications, Westwood, NJ, U.S.A. 1992.