Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 968-971

  Eder Kapl, Stefan ^a   Haugeneder, Ernst ^a   Langfischer, Helmut ^a   Reimer, Klaus ^b   Eichholz, Joerg ^b   Witt, Martin ^b   Doering, Hans Joachim ^c   Heinitz, Joachim ^c   Brandstaetter, Christoph ^d  

^a IMS NANOFABRICATION AG   (Austria)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^c Vistec Electron Beam GmbH   (Germany)

^d BioControl Jena GmbH   (Germany)

Author keywords

Aperture plate system; Mask less lithography; ML2; Multi beam blanking aperture array

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC POTENTIAL; ELECTRODES; ELECTRON BEAMS; MICROELECTRONICS;

APERTURE PLATE SYSTEM; MASK-LESS LITHOGRAPHY; ML2; MULTI BEAM BLANKING APERTURE ARRAY;

LITHOGRAPHY;

EID: 33646025845     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.246     Document Type: Article

References (5)

1. SEMATECH Maskless Workshop, January 17th-19th, 2005. Available from: .
2. Loeschner H., et al. JM3 - J. Microlith. Microfab. Microsyst. 2 1 (2003) 35-48
3. Brandstaetter C., et al. Proc. SPIE 5835 (2005)
4. Doering H.-J., et al. Proc. SPIE 5751 (2005)
5. S.H. Voss et al., in: Proc. MNE (2005), in press.