Oxygen flow rate dependence of the properties of textured ZnO:Al films

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 19, Issue 9, 2008, Pages 1206-1209

  Duan, Ling Wei ^a,b   Xue, Jun Ming ^b   Yang, Rui Xia ^a   Zhao, Ying ^b   Geng, Xin Hua ^b  

^a HEBEI UNIVERSITY OF TECHNOLOGY   (China)

^b NANKAI UNIVERSITY   (China)

Author keywords

Mid frequency sputtering, ZnO:Al(ZAO) films; Oxygen flow rate; Textural structure wet etching

Indexed keywords

ALUMINUM; ETCHING; FLOW RATE; OXYGEN; SEMICONDUCTING ZINC COMPOUNDS; SOLAR ENERGY; THICK FILMS; THIN FILMS; ZINC ALLOYS; ZINC OXIDE;

GLASS SUBSTRATES; HIGH TRANSMITTANCES; LOW RESISTIVITIES; MID-FREQUENCY SPUTTERING, ZNO:AL(ZAO) FILMS; OXYGEN FLOW RATE; OXYGEN FLOW RATES; SURFACE TEXTURES; TEXTURAL STRUCTURE WET-ETCHING; THIN FILM SOLAR CELLS; ZNO:AL FILMS;

MAGNETRON SPUTTERING;

EID: 54049151263     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. HUANG Yu, SUN Jian, XUE Jun-ming, et al. Preparation of ZnO:Al films by mid-frequency impulse magnetron sputtering[J]. Journal of Optoelectronics · Laser, 2006, 17(12): 1427-1431. (in Chinese)
2. Hupkes J, Rech B, Kluth O. et al. Surface textured MF-sputtered ZnO films formicrocrystalline silicon-based thin-film solar cells[J]. Solar Energy Materials and Solar Cells, 2006, 90: 3054-3060.
3. Rech B, Repmann T, van M N, den Donker, et al. Challenges in microcrystalline silicon based solar cell technology[J]. Thin Solid Films, 2006, 511-512: 548-555.
4. Oliver Kluth, Gunnar Schope a, Bernd Rech a, et al. Comparative material study on RF and DC magnetron sputtered ZnO:Al films. Thin Solid Films, 2006, 502: 311-316.
5. Fay S, Feitknecht L, Schluchter R. Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells[J]. Solar Energy Materials and Solar Cells, 2006, 90: 2960-2967.
6. CHENG Xin-liang, XUE Jun-ming, ZHANG De Kun, et al. Effect of reaction pressure on the characteristics ZnO thin film as TCO grown by MOCVD technique[J]. Journal of Optoelectronics · Laser, 2007, 18(7): 763-766. (in Chinese)
7. Hupkes J, Rech B, Sehrbrock B, et al. Development of surface-textured zinc oxide for thin film silicon solar cells by high rate reactive sputtering[J]. 19th European photovoltaic solar energy conference, 2004, 7-11: 1415-1418.
8. Hupkes J, Recha B, Calnan S, et al. Material study on reactively sputtered zinc oxide for thin film silicon solar cells[J]. Thin Solid Films, 2006, 502: 286-291.
9. Christian May, Richard Menner, Johannes Strumpfel, et al. Deposition of TCO films by reactive magnetron sputtering from metallic Zn:Al alloy targets[J]. Surface and Coatings Technology, 2003, 169-170: 512-516.
10. Sittinger V, Ruske F, Werner W, et al. ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells[J]. Thin Solid Films, 2006, 496: 16-25.