Effect of reaction pressure on the characteristics ZnO thin film as TCO grown by MOCVD technique

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 18, Issue 7, 2007, Pages 763-766

  Chen, Xin Liang ^a   Xue, Jun Ming ^a   Zhang, De Kun ^a   Sun, Jian ^a   Ren, Hui Zhi ^a   Zhao, Ying ^a   Geng, Xin Hua ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Metal organic chemical vapor deposition (MOCVD); Solar cells; Transparent conductive oxide (TCO); ZnO films

Indexed keywords

LIGHT SCATTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; ORGANIC CHEMICALS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; WAVELENGTH;

METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); TRANSPARENT CONDUCTIVE OXIDE (TCO); ZNO FILMS;

THIN FILMS;

EID: 34548286858     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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