Preparation of ZnO:Al films by mid-frequency impulse magnetron sputtering

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 17, Issue 12, 2006, Pages 1427-1431

  Huang, Yu ^a,b   Sun, Jian ^b   Xue, Jun Ming ^b   Ma, Tie Hua ^a   Xiong, Qiang ^c   Zhao, Ying ^b   Geng, Xin Hua ^b  

^a NORTH CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NANKAI UNIVERSITY   (China)

^c Information Industry Office of Hebei Province   (China)

Author keywords

Mid frequency magnetron sputtering; Substrate temperature; ZnO:Al(ZAO) films

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC PROPERTIES; ETCHING; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SOLAR CELLS; SUBSTRATES; ZINC OXIDE;

HALL MOBILITY; MIDFREQUENCY MAGNETRON SPUTTERING; OPTICAL TRANSMITTANCE; SUBSTRATE TEMPERATURE; WET ETCHING;

THIN FILMS;

EID: 33846807811     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. Chen M, Pei Z L, Wang X, et al. Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by magnetron reactive sputtering[J]. J Vac Sci Technol, 2001, A19(3): 600-605.
2. Minami T, Sato H, Imamoto H, et al. Substrate temperature dependence of transparent conducting Al-doped ZnO thin films prepared by magnetron sputtering[J]. Jpn J Appl Phys, 1992, 31(3A): 257-260.
3. Sato H, Tamura Y, Minami T, et al. Aluminium content dependence fo milky transparent conducting ZnO:Al films with textured surface prepared by DC magnetron sputtering[J]. Thin Solid Films, 1994, (246): 86-91.
4. WANG Fang, YANG Bao-he. Deposition and properties of C-oriented ZnO thin films for SAW devices[J]. Journal of Optoelectronics · Laser, 2005, 16(1): 28-31. (in Chinese)
5. ZHANG Xiao-dan, ZHAO Ying, ZHU Feng. Structure studies of microcrystalline silicon thin film using Raman scattering and photo thermal deflection spectra[J]. Journal of Optoelectronics · Laser, 2005, 16(2): 167-170. (in Chinese)