Diamond films with preferred <110> texture by hot filament CVD at low pressure

Diamond and Related Materials

Volumn 17, Issue 12, 2008, Pages 2075-2079

  Yang, Shumin ^a,b   He, Zhoutong ^a,b   Li, Qintao ^a,b   Zhu, Dezhang ^a   Gong, Jinlong ^a  

^a SHANGHAI INSTITUTE OF APPLIED PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Diamond film; Growth rate; Hot filament CVD; Nucleation density

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND CUTTING TOOLS; DIAMONDS; FILAMENTS (LAMP); FILM GROWTH; NUCLEATION; TEXTURES; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

DIAMOND THIN FILMS; GAS PRESSURES; HIGH DENSITIES; HOT FILAMENT CVD; HOT FILAMENTS; LOW PRESSURES; LOWER PRESSURES; NANOCRYSTALLINE DIAMONDS; NUCLEATION DENSITY; NUCLEATION STAGES; TEXTURED GROWTHS;

DIAMOND FILMS;

EID: 54049102387     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.07.005     Document Type: Article

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