Diamond nucleation and growth under very low-pressure conditions

Diamond and Related Materials

Volumn 9, Issue 9, 2000, Pages 1691-1695

  Kang, Jian ^b   Xiao, Changyong ^a   Xiong, Yanyun ^a   Wang, Yuguang ^a   Meng, Qingbo ^a   Lin, Zhangda ^a   Feng, Ke an ^a  

^a INSTITUTE OF PHYSICS   (China)

^b PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; ETCHING; FILM GROWTH; HYDROCARBONS; HYDROGEN; NUCLEATION; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION; NEGATIVE BIAS VOLTAGE; NUCLEATION DENSITY;

DIAMOND FILMS;

EID: 0034274948     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00301-0     Document Type: Article

References (7)

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