Influence of nucleation density on film quality, growth rate and morphology of thick CVD diamond films

Diamond and Related Materials

Volumn 12, Issue 9, 2003, Pages 1488-1494

  Tang, C J ^a   Neves, A J ^a   Fernandes, A J S ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Diamond growth and characterization; Growth rate; Microwave plasma CVD; Nucleation density

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; NUCLEATION; PLASMAS; SILICON; TEXTURES;

NATURAL DIAMOND;

DIAMOND FILMS;

DIAMOND;

EID: 0142216097     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00179-1     Document Type: Article

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