Effects of pretreatment and post-annealing on the field emission property of diamond-like carbon grown on a titanium/silicon substrate

Xinxing Tan Cailiao/ New Carbon Materials

Volumn 23, Issue 3, 2008, Pages 209-215

  Huang, Bohr Ran ^a,b   Chun Shin, Yeh ^a,c   Lee, Shih Fong ^d   Wang, Dau Chung ^a   Chen, Kun Gi ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

^d DA YEH UNIVERSITY   (Taiwan)

Author keywords

Diamond like carbon; Field emission; Plasma treatment; Rapid thermal annealing

Indexed keywords

CARBON FILMS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; FIELD EMISSION CATHODES; FIELD EMISSION DISPLAYS; HYDROGEN; HYDROGENATION; PLASMA CVD; RAPID THERMAL ANNEALING; SUBSTRATES; SURFACE ROUGHNESS;

DIAMOND LIKE CARBON; DIAMOND-LIKE CARBON FILM; FIELD-EMISSION CHARACTERISTICS; HYDROGEN PLASMAS; PLASMA PRE-TREATMENT; PLASMA TREATMENT; POST TREATMENT; PRE-TREATMENTS; SILICON SUBSTRATES; TITANIA;

FIELD EMISSION;

EID: 53749095725     PISSN: 20971605     EISSN: 18725805     Source Type: Journal    
DOI: 10.1016/s1872-5805(08)60023-2     Document Type: Article

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