Enhanced electron field emission properties of diamond-like carbon films using a titanium intermediate layer

Journal of Physics D: Applied Physics

Volumn 32, Issue 14, 1999, Pages 1570-1577

  Mao, D S ^a   Zhao, J ^a   Li, W ^a   Wang, X ^a   Liu, X H ^a   Zhu, Y K ^b   Fan, Z ^b   Zhou, J Y ^b   Li, Q ^b   Xu, J F ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CURRENT DENSITY; ELECTRON EMISSION; INTERFACES (MATERIALS); ION BOMBARDMENT; SECONDARY ION MASS SPECTROMETRY; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND LIKE CARBON FILM; FILTERED ARC DEPOSITION; ION SPUTTERING;

DIAMOND FILMS;

EID: 0032642829     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/14/303     Document Type: Article

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