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Volumn 93, Issue 13, 2008, Pages

Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FABRICATION; III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; INDUCTIVELY COUPLED PLASMA; SEMICONDUCTING INDIUM PHOSPHIDE; SPECTRUM ANALYSIS;

HIGH ASPECT RATIO; MECHANICAL STRESS; OPTICAL PERFORMANCE; SEMICONDUCTOR STRUCTURE;

RIDGE WAVEGUIDES;

EID: 53349175304 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2994691 Document Type: Article

Times cited : (12)

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