First-principles calculations-based model for the reactive ion etching of metal oxide surfaces

Vacuum

Volumn 83, Issue 3, 2008, Pages 599-601

  David, Melanie ^a   Muhida, Rifki ^b   Roman, Tanglaw ^a   Nakanishi, Hiroshi ^a   Diño, Wilson ^a   Kasai, Hideaki ^a   Takano, Fumiyoshi ^c   Shima, Hisashi ^c   Akinaga, Hiro ^c  

^a OSAKA UNIVERSITY   (Japan)

^b INTERNATIONAL ISLAMIC UNIVERSITY MALAYSIA   (Malaysia)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Density functional theory; Iron; Metal oxides; Nickel; Reactive ion etching (RIE)

Indexed keywords

CHLORINE COMPOUNDS; DENSITY FUNCTIONAL THEORY; METALLIC COMPOUNDS; METALS; PROBABILITY DENSITY FUNCTION; PROCESS DESIGN; PROCESS ENGINEERING;

ATOMIC SCALES; FIRST-PRINCIPLES CALCULATIONS; IRON; METAL OXIDES; METAL-OXIDE SURFACES; NICKEL; PROCESS MECHANISMS; REACTIVE ION ETCHING (RIE); TOTAL-ENERGY CALCULATIONS;

REACTIVE ION ETCHING;

EID: 52949145995     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.033     Document Type: Article

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