Reactive ion etching of NiFe thin films from first-principles study: A case study

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 2, 2005, Pages 893-894

  Watanabe, Susumu ^a   Diño, Wilson A ^b,c,d   Nakanishi, Hiroshi ^b   Kasai, Hideaki ^b   Akinaga, Hiroyuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d DE LA SALLE UNIVERSITY   (Philippines)

Author keywords

First principles calculations; Magnetic metal; RIE; Ultrafine fabrication technique

Indexed keywords

AMMONIA; APPROXIMATION THEORY; CARBON MONOXIDE; MAGNETIC MATERIALS; NICKEL COMPOUNDS; OXYGEN; REACTIVE ION ETCHING;

FIRST-PRINCIPLES CALCULATIONS; GENERALIZED GRADIENT APPROXIMATION (GGA); MAGNETIC METALS; ULTRAFINE FABRICATION TECHNIQUE;

THIN FILMS;

EID: 17444387119     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.893     Document Type: Article

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