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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1273-1277

Effects of ultraviolet illumination on dry etch rates of NiFe-based magnetic multilayers

(5) Cho, H a Lee, K P a Hahn, Y B a,b Lambers, E S a Pearton, S J a

a University of Florida (United States)

b Chonbuk National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DRY ETCHING; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; MULTILAYERS; NICKEL ALLOYS; PLASMA ETCHING; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

INDUCTIVELY COUPLED PLASMA (ICP); NICKEL IRON ALLOY;

MAGNETIC FILMS;

EID: 0034225987 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.582339 Document Type: Article

Times cited : (10)

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