Influence of ZnO homobuffer layer on n-ZnO/p-Si photodiode

Materials Science and Technology

Volumn 24, Issue 8, 2008, Pages 1002-1004

  Qi, H X ^a,b   Li, Q S ^b   Zhao, B ^b   Zheng, M M ^b   Li, X S ^b   Zhang, N ^b  

^a JINING UNIVERSITY   (China)

^b QUFU NORMAL UNIVERSITY   (China)

Author keywords

Buffer layer; n ZnO p Si photoiode; Pulsed laser deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; EPITAXIAL GROWTH; HETEROJUNCTION BIPOLAR TRANSISTORS; IMAGING TECHNIQUES; LEAKAGE CURRENTS; METALLIC FILMS; MICROSCOPIC EXAMINATION; NONMETALS; OPTICAL DESIGN; OPTICAL WAVEGUIDES; OXYGEN; PHOTODIODES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SCANNING PROBE MICROSCOPY; SEMICONDUCTING ZINC COMPOUNDS; SILICON; XENON; ZINC ALLOYS;

BUFFER LAYER; CRYSTALLINITY; CURRENT-VOLTAGE MEASUREMENTS; HETEROJUNCTION PHOTODIODES; N-ZNO/P-SI PHOTOIODE; PHOTO-RESPONSIVITY; SI SUBSTRATE; THIN LAYERING; X-RAY DIFFRACTION; XE ARC LAMPS; ZNO FILMS; ZNO/P-SI;

ZINC OXIDE;

EID: 52649145482     PISSN: 02670836     EISSN: None     Source Type: Journal    
DOI: 10.1179/174328407X161286     Document Type: Article

References (15)

1. S. Im, B. J. Jin and S. Yi: J. Appl. Phys., 2000, 87, 4558-4561.
2. J. G. E. Gardeniers, Z. M. Rittersma and G. J. Burger: J. Appl. Phys., 1998, 83, 7844-7854.
3. K. M. Lakin and J. S. Wang: Appl. Phys. Lett., 1981, 38, 125-127.
4. K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant, J. A. Voight and B. E. Gnade: J. Appl. Phys., 1996, 79, 7983-7990.
5. D. M. Bagnall, Y. F. Chen, Z. Zhu, T. Yao, S. Koyama, M. Y. Shen and T. Goto: Appl. Phys. Lett., 1997, 70, 2230-2232.
6. J. M. Bian, X. M. Li, X. D. Gao, W. D. Yu and L. D. Chen: Appl. Phys. Lett. 2004, 84, 541-543.
7. S. B. Zhang, S. H. Wei and A. Zunger: Phys. Rev. B, 2001, 63B, 075205.
8. Y. S. Choi, J. Y. Lee, W. H. Choi, H. W.Yeom and S. Im: Jpn J. Appl. Phys., 2002, 41, 7357-7358.
9. J. Y. Lee, Y. S. Choi, W. H. Choi, H. W. Yeom, Y. K. Yoon, J. H. Kim and S. Im: Thin Solid Films, 2002, 420-421, 112-116.
10. I. S. Jeong, J. H. Kim and S. Im: Appl. Phys. Lett., 2003, 83, 2946-2948.
11. G. Koster, G. J. H. Rijnders, D. H. Blank, and H. Rogalla: Appl. Phys. Lett., 1999, 74, 3729-3731.
12. W. T. Lim and C. H. Lee: Thin Solid Films, 1999, 353, 12-15.
13. J. Y. Lee, Y. S. Choi, J. H. Kim, M. O. Park and S. Im: Thin Solid Films, 2002, 403-404, 553-557.
14. T. Ohgaki, N. Ohashi, H. Kakemoto and S. Wada: J. Appl. Phys., 2003, 93, 1961-1965.
15. E. K. Liu, B. S. Zhu and J. S. Luo: 'Semiconductor physics', 4th edn, 239-244; 1994, Beijing, National Defense Industry Press.