Analysis of the transport of ionized titanium atoms in a highly ionized sputter deposition process

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  de Poucques, Ludovic ^a   Imbert, Jean Christophe ^a   Boisse Laporte, Caroline ^a   Bretagne, Jean ^a   Ganciu, Mihaï ^a   Teulé Gay, Lionel ^a   Vasina, Petr ^b   Touzeau, Michel ^a  

^a UNIVERSITÉ PARIS SUD   (France)

^b Department of Physical Electronics ^*  (Czech Republic)

Author keywords

Ambipolar diffusion; Charged particle transport; Diffusion; High power pulsed magnetron sputtering; Langmuir probe; Optical absorption spectroscopy; Surfaces

Indexed keywords

ABSORPTION SPECTROSCOPY; IONIZATION; IONS; LANGMUIR PROBES; LIGHT ABSORPTION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SURFACES;

AMBIPOLAR DIFFUSION; AMBIPOLAR DIFFUSION COEFFICIENTS; CHARGED PARTICLE TRANSPORT; HIGH POWER PULSED MAGNETRON SPUTTERING; HIGH POWER PULSED MAGNETRON SPUTTERING (HPPMS); POST-DISCHARGE; PROBE TECHNIQUE; RADIO FREQUENCY PLASMA;

DIFFUSION;

EID: 51849158406     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731102     Document Type: Conference Paper

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